Investigation of nucleation and growth behavior of amorphous Si crystallites in a thin layer between two amorphous SiOx interfaces by nonextensive approach for transformation process | AVESİS

Manisa Celal Bayar Üniversitesi Akademik Veri Yönetim Sistemi

Investigation of nucleation and growth behavior of amorphous Si crystallites in a thin layer between two amorphous SiOx interfaces by nonextensive approach for transformation process

Atıf İçin Kopyala

International Conference on Complexity, Metastability and Nonextensivity, Catania, İtalya, 01 Mayıs 2007, (Tam Metin Bildiri)

Yayın Türü: Bildiri / Tam Metin Bildiri
Basıldığı Şehir: Catania
Basıldığı Ülke: İtalya
Manisa Celal Bayar Üniversitesi Adresli: Evet