Characterization of plasma nitrided X32CrMoV33 die steel

TÜRK A., Bindal C.

Materials and Manufacturing Processes, cilt.24, sa.7-8, ss.898-902, 2009 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 24 Sayı: 7-8
  • Basım Tarihi: 2009
  • Doi Numarası: 10.1080/10426910902844278
  • Dergi Adı: Materials and Manufacturing Processes
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.898-902
  • Anahtar Kelimeler: AISI H10, Activation energy, Compound layer, Die steel, Diffusion coefficient, Diffusion layer, Fe2-3N, Fe4N, Growth rate, Layer thickness, Microhardness, Nitriding, Plasma nitriding, XRD, X32CrMoV33
  • Manisa Celal Bayar Üniversitesi Adresli: Evet

Özet

In this study, nitriding behavior of plasma nitrided X32CrMoV33 die steel was investigated. Nitriding process was carried out at temperatures of 450, 500, and 550°C or treatment time in the range of 2-32h. Depending on nitriding temperature and time, the thickness of compound layer ranged from 2μm to 15μm. The presence of γ-Fe4N, σ-Fe2-3N, α-Fe, and Cr2N phases formed in the compound layer was confirmed by XRD analysis. Using cross-sectional samples and a microhardness indenter, hardness depth profiles were also obtained; it was found that the hardness of compound layer was over 1000HV. Kinetic studies revealed that the effective diffusion coefficients for plasma nitrided X32CrMoV33 are approximately 40.3×10 -14, 99.2×10-14, and 427×10 -14m2s-1 for 450, 500, and 550°C process temperatures, respectively. The activation energy for plasma nitrided X32CrMoV33 steel is 118.77kJ mol-1.